Nanostructured dimethacrylate-based photopolymerizable systems by modification with diblock copolymers

We report the full characterization of a photocurable dimethacrylate-based formulation modified with small amounts (1 and 3 wt%) polystyrene-block-poly(ethylene oxide) (PS-b-PEO) block copolymer (BCP). The UV curable is mixture bisphenol A bis(2-hydroxy-3-methacryloxypropyl)ether (Bis-GMA) triethylene glycol dimethacrylate (TEGDMA) contains phenylbis(2,4,6-trimethylbenzoyl)phosphine oxide (Irgacure819) as photoinitiator. demonstrate that addition amount BCP in uncured able to induce phase separation at nanometer scale. nanoscale structure formed pre-cure stage retained after curing, so obtaining nanostructured solid cross-linked materials. studied materials can be used manufacturing process stereolithography and, therefore, modern 3D printers. ability control formation nanostructures material by adding BCPs formulations could open new opportunities tailor improve properties printed objects.